M. Lercel: search on Z-Library

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1

Gaining Perspective of an Industry’s Readiness for Regulatory Change: A Case Study From the Aviation Industry

Journal:

Journal of Management and Strategy

Year:

2019

File:

PDF, 292 KB

2019

2

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - Vapor deposited release layers for nanoimprint lithography

Zhang, Tong, Kobrin, Boris, Wanebo, Mike, Nowak, Romek, Yi, Richard, Chinn, Jeff, Bender, Markus, Fuchs, Andreas, Otto, Martin, Lercel, Michael J.

Year:

2006

Language:

english

File:

PDF, 500 KB

english, 2006

3

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - RIM-13: A high-resolution imaging tool for aerial image monitoring of patterned and blank EUV reticles

Booth, M., Lercel, Michael J., Brunton, A., Cashmore, J., Elbourn, P., Elliner, G., Gower, M., Greuters, J., Hirsch, J., Kling, L., McEntee, N., Richards, P., Truffert, V., Wallhead, I., Whitfield, M.

Year:

2006

Language:

english

File:

PDF, 1.17 MB

english, 2006

4

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - EUV optical system for the reticle imaging microscope (RIM)

Glatzel, H., Lercel, Michael J., Daniel, J., Khajehnouri, K., Mueller, U., Roff, T., Rosenbohm, J., Sporer, S.

Year:

2006

Language:

english

File:

PDF, 397 KB

english, 2006

5

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Structure and stability characterization of anti-adhesion self-assembled monolayers formed by vapour deposition for NIL use

Garidel, Sophie, Zelsmann, Marc, Voisin, Pauline, Rochat, Nevine, Michallon, Philippe, Lercel, Michael J.

Year:

2007

Language:

english

File:

PDF, 270 KB

english, 2007

6

Role of gas feed delivery and dilutent on oxide etching in an inductively coupled plasma etch system

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

1998

Language:

english

File:

PDF, 388 KB

english, 1998

7

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - First performance results of the ASML alpha demo tool

Meiling, Hans, Meijer, Henk, Banine, Vadim, Moors, Roel, Groeneveld, Rogier, Voorma, Harm-Jan, Mickan, Uwe, Wolschrijn, Bas, Mertens, Bas, van Baars, Gregor, Kürz, Peter, Harned, Noreen, Lercel, Micha

Year:

2006

Language:

english

File:

PDF, 623 KB

english, 2006

8

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - EUV mask and chuck analysis: simulation and experimentation

Nataraju, Madhura, Sohn, Jaewoong, Mikkelson, Andrew R., Turner, Kevin T., Engelstad, Roxann L., Van Peski, Chris K., Lercel, Michael J.

Year:

2006

File:

PDF, 794 KB

2006

9

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Extreme Ultraviolet (EUV) Lithography III - Light sources for EUV lithography at the 22-nm node and beyond

Fomenkov, Igor V., Böwering, Norbert R., Brandt, David C., Brown, Daniel J., Bykanov, Alexander N., Ershov, Alex I., La Fontaine, Bruno, Lercel, Michael J., Myers, David W., Naulleau, Patrick P., Wood

Year:

2012

Language:

english

File:

PDF, 5.11 MB

english, 2012

10

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - Photonic crystals from step and flash imprint lithography

Taylor, J. Christopher, Lercel, Michael J., Hostetler, Tim, Kornilovich, Pavel, Kramer, Ken

Year:

2006

Language:

english

File:

PDF, 868 KB

english, 2006

11

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Magneto-polymer composite particles fabricated utilizing patterned perfluoropolyether elastomer molds

Herlihy, Kevin P., Lercel, Michael J., DeSimone, Joseph M.

Year:

2007

Language:

english

File:

PDF, 1.69 MB

english, 2007

12

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Laser produced EUV light source development for HVM

Endo, Akira, Lercel, Michael J., Hoshino, Hideo, Suganuma, Takashi, Moriya, Masato, Ariga, Tatsuya, Ueno, Yoshifumi, Nakano, Masaki, Asayama, Takeshi, Abe, Tamotsu, Komori, Hiroshi, Soumagne, Georg, M

Year:

2007

Language:

english

File:

PDF, 170 KB

english, 2007

13

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - Effects of low-voltage electron beam lithography

Bolorizadeh, Mehdi, Lercel, Michael J., Joy, David C.

Year:

2006

Language:

english

File:

PDF, 421 KB

english, 2006

14

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - EUV generation from lithium laser plasma for lithography

George, Simi A., Lercel, Michael J., Silfvast, William, Takenoshita, Kazutoshi, Bernath, Robert, Koay, Chiew-Seng, Shimkaveg, Greg, Richardson, Martin, Al-Rabban, Moza, Scott, Howard

Year:

2006

Language:

english

File:

PDF, 546 KB

english, 2006

15

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VII - Kanagawa, Japan (Wednesday 12 April 2000)] Photomask and Next-Generation Lithography Mask Technology VII - Next-generation lithography mask development at the NGL-MCOC

Lercel, Michael J., Racette, Kenneth C., Magg, Christopher, Lawliss, Mark, Collins, Kevin W., Barrett, Monica, Trybendis, Michael J., Bouchard, Lucien, Morimoto, Hiroaki

Year:

2000

Language:

english

File:

PDF, 3.58 MB

english, 2000

16

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - Defect inspection for imprint lithography using a die-to-database electron beam verification system

Myron, L. Jeff, Lercel, Michael J., Thompson, Ecron, McMackin, Ian, Resnick, Douglas J., Kitamura, Tadashi, Hasebe, Toshiaki, Nakazawa, Shinichi, Tokumoto, Toshifumi, Ainley, Eric, Nordquist, Kevin, D

Year:

2006

Language:

english

File:

PDF, 977 KB

english, 2006

17

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Fabrication of fine pitch gratings by holography, electron beam lithography and nano-imprint lithography

Goodchild, Darren, Lercel, Michael J., Bogdanov, Alexei, Wingar, Simon, Benyon, Bill, Kim, Nak, Shepherd, Frank

Year:

2007

Language:

english

File:

PDF, 574 KB

english, 2007

18

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Chemically amplified resists resolving 25 nm 1:1 line: space features with EUV lithography

Thackeray, James W., Lercel, Michael J., Nassar, Roger A., Brainard, Robert, Goldfarb, Dario, Wallow, Thomas, Wei, Yayi, Mackey, Jeff, Naulleau, Patrick, Pierson, Bill, Solak, Harun H.

Year:

2007

Language:

english

File:

PDF, 1020 KB

english, 2007

19

SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - Utilization of optical emission endpoint in photomask dry etch processing

Faure, Thomas B., Huynh, Cuc, Lercel, Michael J., Smith, Adam, Wagner, Thomas, Dao, Giang T., Grenon, Brian J.

Year:

2002

Language:

english

File:

PDF, 848 KB

english, 2002

20

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - Planarization for reverse-tone step and flash imprint lithography

Lin, Michael W., Lercel, Michael J., Chao, Huang-Lin, Hao, Jianjun, Kim, Eui K., Palmieri, Frank, Kim, Woon C., Dickey, Michael, Ho, Paul S., Willson, C. G.

Year:

2006

Language:

english

File:

PDF, 1.40 MB

english, 2006

21

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - Visible light point-diffraction interferometer for testing of EUVL optics

Takeuchi, Seiji, Lercel, Michael J., Kakuchi, Osamu, Yamazoe, Kenji, Gomei, Yoshio, Decker, Todd A., Johnson, Michael A., Phillion, Donald W., Taylor, John S.

Year:

2006

Language:

english

File:

PDF, 1.89 MB

english, 2006

22

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - EUV lithography program at IMEC

Goethals, Anne Marie, Lercel, Michael J., Jonckheere, Rik, Lorusso, Gian Francesco, Hermans, Jan, Van Roey, Frieda, Myers, Alan, Chandhok, Manish, Kim, Insung, Niroomand, Ardavan, Iwamoto, Fumio, Step

Year:

2007

Language:

english

File:

PDF, 462 KB

english, 2007

23

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Inspection with the Lasertec M7360 at the SEMATECH Mask Blank Development Center

Cho, Wonil, Lercel, Michael J., Kearney, Patrick A., Gullikson, Eric M., Jia, Anwei, Tamura, Tomoya, Tajima, Atsushi, Kusunose, Hal, Jeon, Chan-Uk

Year:

2007

Language:

english

File:

PDF, 305 KB

english, 2007

24

SPIE Proceedings [SPIE 22nd European Mask and Lithography Conference - Dresden, Germany (Monday 23 January 2006)] 22nd European Mask and Lithography Conference - The magic of 4X mask reduction

Lercel, Michael

Year:

2006

Language:

english

File:

PDF, 226 KB

english, 2006

25

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - Development of Xe- and Sn-fueled high-power Z-pinch EUV source aiming at HVM

Teramoto, Yusuke, Lercel, Michael J., Niimi, Gohta, Yamatani, Daiki, Joshima, Yuki, Bessho, Kazunori, Shirai, Takahiro, Takemura, Tetsu, Yokota, Toshio, Yabuta, Hironobu, Paul, Khokan C., Kabuki, Kiyo

Year:

2006

Language:

english

File:

PDF, 349 KB

english, 2006

26

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - LPP EUV source development for HVM

Hansson, Björn A. M., Lercel, Michael J., Fomenkov, Igor V., Böwering, Norbert R., Ershov, Alex I., Partlo, William N., Myers, David W., Khodykin, Oleh V., Bykanov, Alexander N., Rettig, Curtis L., Ho

Year:

2006

Language:

english

File:

PDF, 900 KB

english, 2006

27

Characterization and Lithographic Performance of Silsesquioxane 193nm Bilayer Resists

Ito, Hiroshi, Truong, Hoa D, Burns, Sean D., Pfeiffer, Dirk, Huang, Wu-Song, Khojastech, Mahmoud M., Varanasi, P. Rao, Lercel, Mike

Journal:

Journal of Photopolymer Science and Technology

Year:

2005

File:

PDF, 851 KB

2005

28

Electron beam nanofabrication with self-assembled monolayers of alkylthiols and alkylsiloxanes

M.J. Lercel, G.F. Redinbo, M. Rooks, R.C. Tiberio, H.G. Craighead, C.W. Sheen, D.L. Allara

Journal:

Microelectronic Engineering

Year:

1995

Language:

english

File:

PDF, 1.06 MB

english, 1995

29

Modeling mask fabrication and pattern transfer distortions for EPL stencil masks

P. Reu, R. Engelstad, E. Lovell, C. Magg, M. Lercel

Journal:

Microelectronic Engineering

Year:

2001

Language:

english

File:

PDF, 626 KB

english, 2001

30

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - Soft lithography using perfluorinated polyether molds and PRINT technology for fabrication of 3-D arrays on glass substrates

Wiles, Kenton B., Wiles, Natasha S., Herlihy, Kevin P., Maynor, Benjamin W., Rolland, Jason P., DeSimone, Joseph M., Lercel, Michael J.

Year:

2006

Language:

english

File:

PDF, 1.25 MB

english, 2006

31

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - Application of a high-brightness electrodeless Z-pinch EUV source for metrology, inspection, and resist development

Horne, Stephen F., Besen, Matthew M., Smith, Donald K., Blackborow, Paul A., D'Agostino, Robert, Lercel, Michael J.

Year:

2006

Language:

english

File:

PDF, 1.20 MB

english, 2006

32

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Focused ion beam nano patterning for fabrications of III-nitride light emitting diodes

Kim, M. Y., Park, Y. C., Hong, S. S., Kim, B. K., Kim, D. W., Lee, D. Y., Lercel, Michael J.

Year:

2007

Language:

english

File:

PDF, 2.04 MB

english, 2007

33

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Low-viscosity and fast-curing polymer system for UV-based nanoimprint lithography and its processing

Vogler, Marko, Bender, Markus, Plachetka, Ulrich, Fuchs, Andreas, Wiedenberg, Sabine, Reuther, Freimut, Grützner, Gabi, Kurz, Heinrich, Lercel, Michael J.

Year:

2007

Language:

english

File:

PDF, 1.16 MB

english, 2007

34

Improved electron-beam patterning of Si with self-assembled monolayers

Whelan, C. S., Lercel, M. J., Craighead, H. G., Seshadri, K., Allara, D. L.

Journal:

Applied Physics Letters

Year:

1996

Language:

english

File:

PDF, 1.54 MB

english, 1996

35

Sub-10 nm lithography with self-assembled monolayers

Lercel, M. J., Craighead, H. G., Parikh, A. N., Seshadri, K., Allara, D. L.

Journal:

Applied Physics Letters

Year:

1996

Language:

english

File:

PDF, 531 KB

english, 1996

36

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Defect mitigation and reduction in EUVL mask blanks

Randive, Rajul, Ma, Andy, Reiss, Ira, Mirkarimi, Paul, Spiller, Eberhard, Beier, Bernd, Uno, Toshiyuki, Kearney, Patrick, Jeon, Chan-Uk, Lercel, Michael J.

Year:

2007

Language:

english

File:

PDF, 514 KB

english, 2007

37

Chemical and electrical properties of interfaces between deposited insulators and La2CuO4

Levy, A., Lercel, M. J., Falck, J. P., Kastner, M. A., Bright, A. A., Kleinsasser, A. W.

Journal:

Journal of Applied Physics

Year:

1992

Language:

english

File:

PDF, 688 KB

english, 1992

38

Self-assembled monolayer electron-beam resists on GaAs and SiO2

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

1993

Language:

english

File:

PDF, 929 KB

english, 1993

39

Scanning tunneling microscopy based lithography of octadecanethiol on Au and GaAs

Lercel, M. J., Redinbo, G. F., Craighead, H. G., Sheen, C. W., Allara, D. L.

Journal:

Applied Physics Letters

Year:

1994

Language:

english

File:

PDF, 762 KB

english, 1994

40

Electron beam lithography with monolayers of alkylthiols and alkylsiloxanes

Journal:

Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures

Year:

1994

Language:

english

File:

PDF, 771 KB

english, 1994

41

Self-assembled monolayer electron beam resist on GaAs

R. C. Tiberio, H. G. Craighead, M. Lercel, T. Lau, C. W. Sheen, D. L. Allara

Year:

1993

Language:

english

File:

PDF, 761 KB

english, 1993

42

Plasma etching with self-assembled monolayer masks for nanostructure fabrication

Journal:

Journal of Vacuum Science & Technology A Vacuum Surfaces and Films

Year:

1996

Language:

english

File:

PDF, 899 KB

english, 1996

43

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Photocurable silicon-based materials for imprinting lithography

Hao, Jianjun, Lin, Michael W., Palmieri, Frank, Nishimura, Yukio, Chao, Huang-Lin, Stewart, Michael D., Collins, Austin, Jen, Kane, Willson, C. Grant, Lercel, Michael J.

Year:

2007

Language:

english

File:

PDF, 1.02 MB

english, 2007

44

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Carbon accumulation and mitigation processes, and secondary electron yields of ruthenium surfaces

Yakshinskiy, B. V., Wasielewski, R., Loginova, E., Madey, Theodore E., Lercel, Michael J.

Year:

2007

Language:

english

File:

PDF, 306 KB

english, 2007

45

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - Multi-level step and flash imprint lithography for direct patterning of dielectrics

Palmieri, Frank, Stewart, Michael D., Wetzel, Jeff, Hao, Jianjun, Nishimura, Yukio, Jen, Kane, Flannery, Colm, Li, Bin, Chao, Huang-Lin, Young, Soo, Kim, Woon C., Ho, Paul S., Willson, C. G., Lercel,

Year:

2006

Language:

english

File:

PDF, 704 KB

english, 2006

46

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Carbon deposition on multi-layer mirrors by extreme ultra violet ray irradiation

Matsunari, S., Aoki, T., Murakami, K., Gomei, Y., Terashima, S., Takase, H., Tanabe, M., Watanabe, Y., Kakutani, Y., Niibe, M., Fukuda, Y., Lercel, Michael J.

Year:

2007

Language:

english

File:

PDF, 631 KB

english, 2007

47

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Direct three-dimensional nanoscale thermal lithography at high speeds using heated atomic-force microscope cantilevers

Hua, Yueming, Saxena, Shubham, Lee, Jung C., King, William P., Henderson, Clifford L., Lercel, Michael J.

Year:

2007

Language:

english

File:

PDF, 356 KB

english, 2007

48

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Whole wafer imprint patterning using step and flash imprint lithography: a manufacturing solution for sub-100-nm patterning

Lentz, David, Doyle, Gary, Miller, Mike, Schmidt, Gerald, Ganapathisuramanian, Maha, Lu, Xiaoming, Resnick, Doug, LaBrake, Dwayne L., Lercel, Michael J.

Year:

2007

Language:

english

File:

PDF, 2.07 MB

english, 2007

49

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Development of optics for EUV lithography tools

Murakami, Katsuhiko, Oshino, Tetsuya, Kondo, Hiroyuki, Chiba, Hiroshi, Komatsuda, Hideki, Nomura, Kazushi, Iwata, Hiromitsu, Lercel, Michael J.

Year:

2007

Language:

english

File:

PDF, 601 KB

english, 2007

50

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - EUV generation using a droplet of a suspension including tin as a target of a high-efficiency LPP source for high volume production

Tomie, Toshihisa, Sarjono, S., Yashiro, H., Moriwaki, H., Matsushima, I., Lercel, Michael J.

Year:

2006

Language:

english

File:

PDF, 243 KB

english, 2006